Shannon Davis / Solid State Technology
IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Confer – Novatoday announced that its co-authored paper with IBM Research on In-Line Raman Spectroscopy for Stacked Nanosheet Device Manufacturing has been selected as the winner of the Diana Nyyssonen award for best paper at SPIEs2021 Advanced Lithography Symposia. IBM Research and Nova Jointly Awarded the Best Metrology Paper at SPIE Advanced …
